Equipment Details



Name of the EquipmentPlasma asher
Categorygold contaminated
OperatorShilpa Kharat
Minita Surwade
System OwnerAnuj Kumar Singh
184126002@iitb.ac.in

Minita Surwade
minita@iitb.ac.in

Short NameAsher
Make/ ModelFabricated in CEN/ NA
Critical ToolYes
Serial NumberNA
FootPrintwidth=0.69m, Depth 1.2m, Height 1.56m
InstallationDate2007
Equipment TypeDry Etch tools
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerNA

NA
Actual DealerNA

NA
SOP SOP/87_SOP.pdf
Training & other policy documents
Recipies
Glimpse GLIMPSE/87_GLIMPSE.pdf
Tool Facilities RequirementsWater connection, Oxygen, CHF3
AccessOpen
Lab Phone No4488 Ext Flash 107 OR 111
Substrate allowedQuartz, Si
Substrate Dimensionmaximun size 2 inch
Chemical allowedNA, ppr, su8, cblack, PDMS, PMMA, metals, oxides, Polymer(VDF-TrFe0/ BaTiO3
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedOxygen, CF4, CHF3
Contamination remarksPowdered material not allowed. And Na+ and K+ are not allowed. For outside/ NCPRE/ Org electronics lab samples, contact SO/ Process engineer.