Equipment Details



Name of the Equipment2 inch Phosphorous_Solid source Diffusion Furnace
Categoryclean
Operator
System Owner
Short NameNA
Make/ Modelassembled/ NA
Critical ToolYes
Serial NumberNA
FootPrint3.75 ft x13 ft
InstallationDate12/03/2003
Equipment TypeDeposition, Growth and Annealing systems
LocationMicro1 Lab
AMC Required
Local DealerNA

Inhouse
Actual DealerNA

Inhouse
SOP SOP/81_SOP.pdf
Training & other policy documents
Recipies
Glimpse GLIMPSE/81_Glimpse.pdf
Tool Facilities Requirementschiller & Exhaust
AccessOpen
Lab Phone No4405
Substrate allowedSi Wafer with RCA cleaning or Piranha cleaning as the immediate previous process allowed
Substrate DimensionQuarter of 2 inch, Half of 2 inch, 2 inch
Chemical allowedSpin on chemicals are not allowed, only silicon wafers (others under contamination clearance)
Precursors/ Targets allowed
*Based on stock availability
PH1025, PH900 PH 950 solid diffusion sources from saint gobain
Precursor/ Target loaded inside tool
Target dimension2 inch only
Gases allowedN2, O2
Contamination remarksclean