Equipment Details



Name of the Equipment2 inch Dry oxidation Furnace
Categoryclean
Operator
System OwnerPankajkumar Gound
p15129@iitb.ac.in

Short NameDry furnace
Make/ ModelAssembled/ NA
Critical ToolYes
Serial NumberNA
FootPrint3.75 ft x13 ft
InstallationDate10/12/2005
Equipment TypeDeposition, Growth and Annealing systems
LocationMicro1 Lab
AMC Required
Local DealerNA

In house maintenance
Actual DealerNA

NA
SOP SOP/78_SOP.zip
Training & other policy documentsPOLICY/78_POLICY.zip
Recipies RECEPIES/78_RECEPIES.zip
Glimpse GLIMPSE/78_Glimpse.pdf
Tool Facilities Requirementschiller & Exhaust
AccessOpen
Lab Phone No4405
Substrate allowedSi Wafer with RCA cleaning
Substrate DimensionQuarter of 2inch, 2inch
Chemical allowedNA, only silicon wafers (others under contamination clearance)
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedN2, O2
Contamination remarks