Equipment Details



Name of the EquipmentPlasma Doping System
Categorysemi clean b
Operator
System Owner
Short NamePDS
Make/ ModelUltech
Critical ToolNo
Serial NumberImpulse 100Series
FootPrint
InstallationDate14/8/2109
Equipment TypeDeposition, Growth and Annealing systems
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerTesscorn Nano Science Inc.

Tesscorn Nano Science Inc. 1285, 5 th Main, 17 th Cross, HSR Sector 7, Bangalore 560102. Landline: +91.80.2572.9425
Actual DealerULTECH Co. Ltd

ULTECH Co.,Ltd. South Korea
SOP SOP/343_SOP.pdf
Training & other policy documentsPOLICY/343_POLICY.pdf
Recipies
Glimpse GLIMPSE/343_GLIMPSE.PDF
Tool Facilities Requirements
AccessOpen
Lab Phone No8025729425
Substrate allowedSi, Ge, C, Sn
Substrate DimensionMax 4 inch
Chemical allowed-, only Group IV (Si, Ge, C, Sn) allowed.
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedPH3, B2H6, Ar, CHF3 , SiH4, O2, N2
Contamination remarksonly Group IV (Si, Ge, C, Sn) allowed.