Equipment Details



Name of the EquipmentWet bench_2” RCA , Piranha
Categoryclean
Operator
System OwnerHemant Kshirsagar
hemant@ee.iitb.ac.in

Anjum Ahmed
anjum04@iitb.ac.in

Short Name
Make/ Model
Critical ToolYes
Serial Number
FootPrint
InstallationDate
Equipment TypeWet chemistry tools
LocationNMPF Lab
AMC Required
Local Dealer

Actual Dealer

SOP
Training & other policy documents
Recipies
Glimpse
Tool Facilities RequirementsPN2, DI water, Blowers, hot plate
AccessOpen
Lab Phone No4435
Substrate allowedSi, Quartz, Diamond, Sapphire
Substrate Dimension2 inch maximum
Chemical allowedHCl, H2O2. NH4OH, HF, DI water,
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedPN2
Contamination remarksOnly new Si wafers are allowed for RCA. Piranha can be done for processed as well as new wafers.