Equipment Details
| Name of the Equipment | AJA 6 Target E beam Evaporator |
| Category | gold contaminated |
| Operator | Anjum Ahmed Mayur Pawar Pijush Chakraborty |
| System Owner | Pijush Chakraborty P14297@iitb.ac.in |
| Short Name | UHV- 6TEBE |
| Make/ Model | AJA International/ ATC-ORION-8E |
| Critical Tool | Yes |
| Serial Number | ORION-8E-9000-12070 |
| FootPrint | (l) 2372.1 mm x (b) 762 mm x (h) 1752.7mm |
| InstallationDate | 04/13/2016 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Mr. Asheesh Ravi, Sales Executive Engineer Anarghya Innovations and Technology Pvt Ltd, Bengaluru. Ph: +91 80 23376488 M : +91-9166563432 www.anarghyainnotech.com |
| Actual Dealer | Mr. Joe Cronin, Customer Service Engineer International, INC 809 Country Way Scituate, MA 02066 781-545-7365 E-mail: topgun@ajaint.com Web: www.ajaint.com |
| SOP | SOP/300_SOP.pdf |
| Training & other policy documents | POLICY/300_POLICY.pdf |
| Recipies | |
| Glimpse | GLIMPSE/300_GLIMPSE.pdf |
| Tool Facilities Requirements | Chiller, N2, CDA |
| Access | Controlled |
| Lab Phone No | 4488 |
| Substrate allowed | Si, Ge, GaN, Quartz |
| Substrate Dimension | From 1cmX1cm pieces upto 4'' wafers |
| Chemical allowed | IPA, Photoresists |
| Precursors/ Targets allowed *Based on stock availability | Ti, Pt(<50nm), W, SiO2, Au(<50nm), Ni, Al2O3, Cr |
| Precursor/ Target loaded inside tool | Ti, Pt(<50nm), Au(<50nm), Ni, Al2O3, Cr |
| Target dimension | 1-6mm pellets/slugs in 15cc crucible liners |
| Gases allowed | N2, CDA |
| Contamination remarks | Gold contaminated |