Equipment Details

Name of the EquipmentChemical Mechanical Planarisation
Categorygold contaminated
System Owner
Short NameCMP
Make/ ModelG&P Technology INC/ POLI � 400L
Critical ToolNo
Serial NumberS/N 4001102
FootPrint4ft x 4ft x 6.5ft
Equipment TypeWet chemistry tools
Location7.1 Lab
AMC Required
Local Dealer

No Local Agent
Actual DealerG&P Technology INC

G&P Technology INC, #304 MEMS/NANO FABRICATION CENTER, Jangjeon-Dong, Guemjeong-Gu, BUSAn, SOUTH KOREA -609735
SOP SOP/184_SOP.pdf
Training & other policy documents
Glimpse GLIMPSE/184_GLIMPSE.rar
Tool Facilities Requirements24 hr DI water, Chiller
Lab Phone No4405
Substrate allowedSi
Substrate Dimension4�,small coupons
Chemical allowedSiO2 and W slurry, SiO2, W
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedNA
Contamination remarksKOH and H2O2