Equipment Details
| Name of the Equipment | Chemical Mechanical Planarisation |
| Category | gold contaminated |
| Operator | |
| System Owner | |
| Short Name | CMP |
| Make/ Model | G&P Technology INC/ POLI � 400L |
| Critical Tool | No |
| Serial Number | S/N 4001102 |
| FootPrint | 4ft x 4ft x 6.5ft |
| InstallationDate | 1373913000 |
| Equipment Type | Wet chemistry tools |
| Location | 7.1 Lab |
| AMC | Required |
| Local Dealer | No Local Agent |
| Actual Dealer | G&P Technology INC G&P Technology INC, #304 MEMS/NANO FABRICATION CENTER, Jangjeon-Dong, Guemjeong-Gu, BUSAn, SOUTH KOREA -609735 |
| SOP | SOP/184_SOP.pdf |
| Training & other policy documents | |
| Recipies | |
| Glimpse | GLIMPSE/184_GLIMPSE.rar |
| Tool Facilities Requirements | 24 hr DI water, Chiller |
| Access | Controlled |
| Lab Phone No | 4405 |
| Substrate allowed | Si |
| Substrate Dimension | 4�,small coupons |
| Chemical allowed | SiO2 and W slurry, SiO2, W |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | KOH and H2O2 |