Equipment Details



Name of the Equipment2 inch Wet oxidation Furnace
Categoryclean
Operator
System OwnerAmita Rawat
154076020@iitb.ac.in

Pankajkumar Gound
p15129@iitb.ac.in

Short NameNA
Make/ ModelNA/ NA
Critical ToolNo
Serial NumberNA
FootPrint3.75ft x 13 ft
InstallationDate05/09/2004
Equipment TypeDeposition, Growth and Annealing systems
LocationMicro1 Lab
AMC Required
Local Dealerassembled

inhouse maintenance
Actual DealerNA

NA
SOP SOP/79_SOP.zip
Training & other policy documentsPOLICY/79_POLICY.zip
Recipies RECEPIES/79_RECEPIES.zip
Glimpse GLIMPSE/79_Glimpse.pdf
Tool Facilities RequirementsN2, O2, H2, Exhaust
AccessOpen
Lab Phone No4405
Substrate allowedSi Wafer with RCA cleaning or piranha cleaning
Substrate DimensionQuarter of 2inch, 2inch
Chemical allowedNA, only silicon wafers (others under contamination clearance)
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedN2, O2, H2
Contamination remarksclean