Equipment Details



Name of the Equipment2 inch Boron_Solid source Diffusion Furnace
Categoryclean
Operator
System OwnerPankajkumar Gound
p15129@iitb.ac.in

Short Name2
Make/ ModelGeneral Signals-Tempress/ NA
Critical ToolNo
Serial NumberNA
FootPrint3.75ft x13ft
InstallationDate11/11/2004
Equipment TypeDeposition, Growth and Annealing systems
LocationMicro1 Lab
AMC Required
Local DealerNA

inhouse maintenance
Actual DealerNA

NA
SOP SOP/76_SOP.pdf
Training & other policy documentsPOLICY/76_POLICY.rar
Recipies
Glimpse GLIMPSE/76_Glimpse.pdf
Tool Facilities RequirementsGases, chiller, Exhaust
AccessOpen
Lab Phone No4405
Substrate allowedSi Wafer with RCA cleaning or Piranha cleaning as the immediate previous process allowed
Substrate DimensionQuarter of 2inch, 2inch
Chemical allowedSpin on chemicals are not allowed, only silicon wafers (others under contamination clearance)
Precursors/ Targets allowed
*Based on stock availability
BNN975 solid diffusion source from sain gobain
Precursor/ Target loaded inside tool
Target dimensionBNN975 solid diffusion source from sain gobain
Gases allowedN2, O2
Contamination remarksPhoto resist spun wafers not to be used