Equipment Details



Name of the EquipmentLPCVD Furnace_Thermal oxidation
Categoryclean
OperatorHemant Kshirsagar
System OwnerPradnya Chabbi
pradnya@ee.iitb.ac.in

Hemant Kshirsagar
hemant@ee.iitb.ac.in

Short Name
Make/ ModelSVCS
Critical Tool
Serial Number
FootPrint
InstallationDate
Equipment TypeDeposition, Growth and Annealing systems
LocationNMPF Lab
AMC Required
Local DealerAkshay

Actual Dealer

info@svcs.cs
SOP
Training & other policy documents
Recipies
Glimpse
Tool Facilities Requirements
AccessControlled
Lab Phone No6287
Substrate allowed
Substrate Dimension
Chemical allowed,
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool
Target dimension
Gases allowed
Contamination remarksOnly RCA cleaned wafers allowed. Processed wafers not allowed.