Equipment Details



Name of the Equipment1.2 Lab wet bench
Categoryclean
OperatorAkhil Kumar S
System Owner
Short NameNil
Make/ ModelLaxmi Instruments/ Nil
Critical ToolNo
Serial NumberNil
FootPrint
InstallationDate2013
Equipment TypeWet chemistry tools
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerLaxmi Instruments

kailas@laxmiinstruments.com
Actual Dealer

kailas@laxmiinstruments.com
SOP
Training & other policy documents
Recipies
Glimpse
Tool Facilities RequirementsNitrogen,DI Water
AccessOpen
Lab Phone No4488
Substrate allowedSilicon,quartz,Ge, GaN
Substrate Dimensionmax 4
Chemical allowedAcetone,IPA,Hf, IPA, Acetone, BHF 2%HF and HCL
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedNitrogen for drying
Contamination remarksOnly cleaning of wafers allowed. Lift off not allowed.