Equipment Details



Name of the EquipmentMolecular Beam Epitaxy Si, Ge, Sn
Categoryclean
OperatorJASWANT RATHORE
Ravindra Singh Pokharia
System Owner
Short NameC12 MBE
Make/ ModelRIBER/ Compact 12
Critical ToolNo
Serial NumberSYS 14500
FootPrint3.5 x 2 x 3 m
InstallationDate01/31/2014
Equipment TypeDeposition, Growth and Annealing systems
LocationMBE Clean Room 1 (NanoE bldg, Gr floor)
AMC Required
Local DealerNA

NA
Actual DealerRIBER

customerservice@riber.fr Tel: +33 (1) 39 96 65 28 Tel: +33 (1) 39 96 66 00
SOP
Training & other policy documents
Recipies
Glimpse
Tool Facilities RequirementsPN2- 99.999%, Compressed Air, Water Chiller, Liquid N2
AccessControlled
Lab Phone No4488 Ext Flash 105
Substrate allowedSi, Ge, Sn
Substrate DimensionQuarter of 2 inch wafer (Fixed)
Chemical allowedNA, Si, Ge, Sn (Are available for Process)
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedNA
Contamination remarksNo earlier processed Samples allowed. Only cleaned Si and Ge wafers