Equipment Details



Name of the EquipmentMulti-pocket Electron-beam Evaporator (4 target - GaN)
Categorygold contaminated
OperatorAkhil Kumar S
Sreenadh Surapaneni
System OwnerYogendra Yadav
yogendra.yadav@iitb.ac.in

Sreenadh Surapaneni
164070005@iitb.ac.in

Short NameGaN Evaporator
Make/ Model/
Critical ToolNo
Serial Number
FootPrint
InstallationDate04/26/2014
Equipment TypeDeposition, Growth and Annealing systems
LocationMicro1 Yellow Room
AMC Required
Local DealerOerlikon Leybold Vacuum India Pvt. Ltd.

sandeep.chaudhari@oerlikon.com
Actual DealerSandep chaudhri

NA
SOP SOP/212_SOP.pdf
Training & other policy documentsPOLICY/212_POLICY.pdf
Recipies
Glimpse GLIMPSE/212_GLIMPSE.pdf
Tool Facilities RequirementsWater Chiller
AccessControlled
Lab Phone No4493
Substrate allowedOnly semiconducting substrates are allowed. No glass.
Substrate DimensionApprox 4 Inch or less
Chemical allowedIPA for cleaning, Ti/ Al/ Ni/ Au
Precursors/ Targets allowed
*Based on stock availability
Ti/ Al/ Ni/ Au
Precursor/ Target loaded inside tool
Target dimensionSlugs
Gases allowedPN2 for venting
Contamination remarksTop surface is either PR coated or stable element and Only clean room processed wafers are allowed. The wafer should not have goneout of the clean room at any time.wafers processed in clean tools are only allowed