Equipment Details



Name of the Equipment4 inch RCA Clean Station
Categoryclean (for si)
OperatorMinita Surwade
Pankajkumar Gound
System OwnerMinita Surwade
minita@iitb.ac.in

Pankajkumar Gound
p15129@iitb.ac.in

Short Name
Make/ ModelLaxmi Instruments/ NA
Critical ToolNo
Serial Number200801132 (P O numbe
FootPrint
InstallationDate
Equipment TypeWet chemistry tools
LocationWet Chemistry lab
AMC Required
Local DealerRupesh Khule

07208246450(for DI water system)
Actual DealerNil

Nil
SOP SOP/183_SOP.rar
Training & other policy documentsPOLICY/183_POLICY.pdf
Recipies RECEPIES/183_RECEPIES.pdf
Glimpse GLIMPSE/183_GLIMPSE.pdf
Tool Facilities RequirementsDI water, Hot plate
AccessOpen
Lab Phone No4464
Substrate allowedSi
Substrate DimensionMaximum 4 inch Si wafers
Chemical allowedAmmonium Hydroxide, H2O2, HCl, HF, DI water, Only RCA chemicals and DI water
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedPN2 for drying
Contamination remarksNo other chemicals allowed. No glasswares allowed. Only teflon and quartz is allowed. Sodium and potassium contamination strictly prohibited.